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EVG®620 Double Side Mask Aligner

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Categories New Product Introductions GenISys GmbH Layout LAB Software

Layout LAB Software

Highlights:

High advanced data I/O interface for most popular formats like GDSII, DXF, CIF, CTXT, TextLib, jpg, gif bmp, pcx and tif
Enabling flexible design of processes by modifying mask layout (Bias, Heal,…), exposure tool or resist parameters
Powerful 3-D visualization for easy verification and optimization of the printed result on the wafer
Unique database driven, modular, process flow oriented concept combining performance, flexibility and user-friendliness

For details and specifications please download the product sheet as below.

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